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 MNC 2010 |
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The MNC conference is now in its 23rd year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
SCOPE
1. Lithography and Related Technologies
1‑1. DUV, EUV Lithography and Metrology
1‑2. Electron‑ and Ion‑Beam Lithography
1‑3. Resist Materials and Processing
2. Nanotechnology
2‑0. Nanocarbon
2‑1. Nanodevices
2‑2. Nanofabrication
2‑3. Nanomaterials
2‑4. Nanotool
3. Nanoimprint, Nanoprint and Rising Lithography
4. BioMEMS, Lab. on a Chip
5. Microsystem Technology and MEMS
Important Deadlines:
Abstract Deadline: June 30, 2010
Late News Paper Deadline: September 15, 2010 Registration Deadline: October 20, 2010
JJAP Deadline: November 30, 2010
For further information please see http://imnc.jp. |
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| Place: | Rihga Royal Hotel Kokura, Fukuoka, Japan |
| Country: | Japan |
| Date: | 09.-12. November 2010 |
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© 2005 austrian nano forum / austrian nano initiative
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